臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Showing items 1-7 of 7 (1 Page(s) Totally)
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Institution	Date	Title	Author
臺大學術典藏	2022-01-03T08:01:20Z	Simulation and fabrication results of electron optical systems for massively parallel maskless lithography	Hoi-Tou Ng; Chien-Chieh Huang; Hsing-Hong Chen; Shin-Chuan Chen; Ken-Hsien Hsieh; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI
臺大學術典藏	2018-09-10T08:18:21Z	Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography	Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography	Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:19Z	Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography	Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:19Z	Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography	Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:07Z	Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography	Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:07Z	Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography	Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI

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